This course covers applications and various microfabrication methods to design and fabricate MEMS/NEMS devices. Methods include, patterning based on photolithography, deposition, etching (wet & dry), nanofabrication technologies, next-generation fabrication technologies, and the physics behind them. Enrollment preference is given to any students.
By the end of this course, students will be able to:
1) Acquire the baseline knowledge about the theory and methods of various microfabrication techniques based on photolithography, and the ability to apply for developing the MEMS/NEMS devices.
2) Design the basic level of MEMS/NEMS devices.
MEMS, NEMS, Micromachine, Nanomachine, Photolithography, Deposition, Wet&Dry etching, Nanofabrication, Next-generation fabrication technology
|✔ Specialist skills||Intercultural skills||Communication skills||Critical thinking skills||Practical and/or problem-solving skills|
Each theme every week.
|Course schedule||Required learning|
|Class 1||Overview of MEMS/NEMS||Study what are MEMS?, and the applications.|
|Class 2||Patterning||Understand the patterning method base on photolithography.|
|Class 3||DepositionStudy various deposition methods.||Understand the various deposition methods.|
|Class 4||Wet etching||Understand what the wet etching is.|
|Class 5||Dry etching||Understand what the dry etching is.|
|Class 6||Nano-fabrication||Study nanofabrication methods.|
|Class 7||Integration of various micro and nano fabrication processes||Learn the technology that integrates various micro and nano fabrication processes.|
To enhance effective learning, students are encouraged to spend approximately 100 minutes preparing for class and another 100 minutes reviewing class content afterwards (including assignments) for each class.
They should do so by referring to textbooks and other course material.
Japanese printed material only
Japanese book only.
By final test(about 70%) and assignments (about 30%)