Thin-film growth and micro-patterning process of functional ceramics are important technologies, which have realized high-performance electronic devices, such as smart phone and tablet terminal, and environment devices, such as power generation (storage) devices and LEDs. In this lecture, students study film-growth and device-fabrication technologies, as well as characterization methods of ceramic thin films. In the first half, the lecture focuses on basic of thin-film growth techniques, and in the last half, it focuses on micro-patterning technologies and characterization methods, in connection with actual devices.
Students will acquire the following skills by taking this course.
1) Learn the basic science of thin-film growth.
2) Acquire skills of film formation.
3) Learn device fabrication process.
4) Learn characterization techniques for thin films.
5) Understand application of thin-film technologies in the engineering field.
Ceramics thin film, thin-film growth, Physical vapor deposition, Chemical vapor deposition, Micro-patterning, Scanning probe microscope, Structure analysis, Chemical composition analysis, Surface analysis, Electronic state analysis, Electronic property, Optical property, Dielectric property, Thermoelectric property, Magnetic property, Superconducting property
|Intercultural skills||Communication skills||Specialist skills||Critical thinking skills||Practical and/or problem-solving skills|
Exercise problems will be given.
|Course schedule||Required learning|
|Class 1||Introduction of thin-film technology||Students have to understand the importance of thin-film-growth technique, micro-patterning technology, and film-property characterization.|
|Class 2||Basic of thin-film growth||Students have to explain the thin-film form and crystal growth modes.|
|Class 3||Epitaxial growth, Hetero-junction, Superlattice||Students have to explain the epitaxial film growth, and fabrication method of hetero-junction and superlattice, on single crystalline substrate.|
|Class 4||Physical vapor deposition||Students have to explain the vacuum deposition and molecular beam epitaxy method.|
|Class 5||Physical vapor deposition (II)||Students have to explain the Sputtering and Laser ablation method.|
|Class 6||Chemical vapor deposition||Students have to explain the Chemical vapor deposition method.|
|Class 7||Special thin-film growth techniques||Students have to explain the solid-phase epitaxy, liquid-phase epitaxy, and solution process for thin-film growth.|
|Class 8||Thin-film micro-patterning technologies||Students have to explain patterning process by lithography and micro-patterning technologies by etching process|
|Class 9||Structural analysis||Students have to explain the crystal structure analysis of thin film by X-ray diffraction and electron microscope.|
|Class 10||Chemical composition and electronic state analysis||Students have to explain the chemical analysis and electronic state characterization of thin film.|
|Class 11||Surface analysis||Students have to explain the surface analysis of thin film by scanning probe microscope.|
|Class 12||Electronic properties of thin film and characterization methods||Students have to explain the characterization methods of electronic properties of thin film.|
|Class 13||Optical-dielectric properties of thin film and characterization methods||Students have to explain the characterization methods of optical-dielectric properties of thin film.|
|Class 14||Superconducting-magnetic-thermoelectric properties of thin film and characterization methods||Students have to explain the characterization methods of superconducting-magnetic-thermoelectric properties of thin film.|
|Class 15||Review||Students review thin-film growth processes, micro-patterning technologies, and analysis methods.|
All materials used in class can be found on OCW-i in advance.
Reference books: Donald L. Smith ed. Thin-Film Deposition: Principles and Practice
Exercise problems (50%) will be given in the class every time and Reporting assignment (50%) will be give after the final class.