2018 Plasma Chemistry and Plasma Processing

Font size  SML

Register update notification mail Add to favorite lecture list
Academic unit or major
Graduate major in Chemical Science and Engineering
Instructor(s)
Mori Shinsuke 
Course component(s)
Lecture
Day/Period(Room No.)
Mon3-4(S223)  
Group
-
Course number
CAP.C533
Credits
1
Academic year
2018
Offered quarter
3Q
Syllabus updated
2018/10/1
Lecture notes updated
-
Language used
English
Access Index

Course description and aims

[Summary of Lecture] This course focuses on the chemical process using plasma technology. The basic knowledge and characteristics of plasma, plasma generation methods and applications of plasma technology to the chemical processes are lectured. [Aim of Lecture] This lecture aims for students to understand the basic knowledge of the plasma chemistry and plasma processing and to acquire the ability to design and optimize the chemical processes using plasma technology.

Student learning outcomes

[Target] Target of this course is to understand and obtain the basic knowledge and characteristics of thermal & non-thermal plasma, thermal & non-thermal plasma generation methods and applications of plasma technology to the chemical processes and to acquire the ability to design and optimize the chemical processes using plasma technology.

Keywords

plasma, gas discharge, etching, chemical vapor deposition, sputtering, surface modification

Competencies that will be developed

Intercultural skills Communication skills Specialist skills Critical thinking skills Practical and/or problem-solving skills
- - -

Class flow

At the beginning of each class, solutions to exercise problems that were assigned during the previous class are reviewed. Then the main points of the day’s lecture are given as exercise. At the end of class, students are asked to solve the exercise.

Course schedule/Required learning

  Course schedule Required learning
Class 1 Basics of plasma To explain basics of plasma
Class 2 Types of Gas Discharges To explain types of gas discharges
Class 3 Townsend Mechanism of Electrical Breakdown To explain Townsend mechanism of electrical breakdown
Class 4 Streamer Mechanism of Electrical Breakdown To explain streamer mechanism of electrical breakdown
Class 5 Gas Phase Reactions in Plasma To explain characteristics of plasma chemical reactions and calculate their reaction rates
Class 6 Plasma Sheath and Surface Reactions in Plasma To explain plasma sheath and surface reactions in plasma
Class 7 Non-Thermal Plasma Processing (I) To explain non-thermal plasma processing
Class 8 Non-Thermal Plasma Processing (II) To explain non-thermal plasma processing

Textbook(s)

None required

Reference books, course materials, etc.

Materials provided in the class will be used.

Assessment criteria and methods

Assessment is based on the exercise and final exam

Related courses

  • CAP.C206 : Chemical Reaction Engineering I (Homogeneous System)
  • CAP.C211 : Energy Transfer Operation
  • CAP.C201 : Transport Phenomena I (Momentum)
  • CAP.C202 : Transport Phenomena II (Heat)
  • CAP.C203 : Transport Phenomena III (Mass)
  • CAP.C421 : Advanced Energy Transfer Operation
  • CAP.C422 : Advanced Chemical Reaction Engineering

Prerequisites (i.e., required knowledge, skills, courses, etc.)

No prerequisites.

Contact information (e-mail and phone)    Notice : Please replace from "[at]" to "@"(half-width character).

mori.s.aa[at]m.titech.ac.jp : Shinsuke Mori

Office hours

Make a reservation by e-mail in advance.

Page Top