Students will learn the fundamental techniques of SEM imaging and evaluation methods via operation of SEM.
The goal of this class is to achieve several important observation and evaluation techniques through SEM operatoin by yourself.
scanning electron microscopy, SEM, secondary electron image, back scattering electoron image, wave dispersive X-ray spectroscopy, energy dispersive X-ray analysis
✔ Specialist skills | Intercultural skills | Communication skills | ✔ Critical thinking skills | ✔ Practical and/or problem-solving skills |
Student will conduct SEM operation under the instruction of teaching staffs.
(instructor: Masaru Tada, Ookayama Materials Anaslysis Devision, Technical Department)
Course schedule | Required learning | |
---|---|---|
Class 1 | Theory and practical operation To understand the principals for SEM imaging, e.g. magnification, focus, astigmatism, brightness, contrust, etc. | To achieve the principles of scanning electron microscope in terms of observation, operation, samples. |
Class 2 | Geometrical effects on secondary electron imaging To understand irradiation and emittion of electrons, oblique angle of sample surface and its contrast, emittion of secondary electrons from different surface morphology, relation of SEM image and position of detector, charge-up and conductivity of sample surface | To understand that secondary electron image (SEI) is greatly influenced by material, sample preparation, surface roughness, etc. |
Class 3 | Effect of acceleration voltage and irradiation current To understand working distance and focus level, effect of acceleration voltage and irradiation current on secondary electron image, damage of sample surface during observation | to understand the effect of acceleration volutage and irradiation current on SEI |
Class 4 | Back scattering electron imaging To understand SEI (secondary electron image) and BEI(back scattering electron imaging, or, composition image) and several imaging techniques associated with composition and topology of sample surface, sample inclination, channeling contrast, etc. | to understand the difference between back scattered image (BEI) and SEI |
Class 5 | WDS analysis I To understand principals of characteristic X-ray and spectroscopy (EDS, WDS) BEI and WDS analysis Sample height and WDS spectrum Quantitative analysis | To understand composition analysis in terms of EDS (enegy dispersive spectroscopy) and WDS (wave dispersive spectroscopy) |
Class 6 | EDS analysis I To understand EDS spectrum, Peak identification, Spot analysis, Signal and Noise ratio of EDS and WDS | To understand peak identification by EDS analysis. |
Class 7 | EDS analysis II To understand EDS mapping of surface with certain roughness | To understand the influence of surface roughness and the image quality of EDS mapping. |
To enhance effective learning, students are encouraged to spend approximately 100 minutes preparing for class and another 100 minutes reviewing class content afterwards (including assignments) for each class.
They should do so by referring to textbooks and other course material.
e.g., "SHIN SOUSAGATA DENSHI KENBIKYO"(NIHON KENBIKYO GAKKAI)
Handout will be given by instructor.
General discussion will be made during the period of evaluation test and supplementary classes.
Achievement will be evaluated by the quality of assignments (100%)
Fundamental knowledge of material science is recommended.
Due to the reason of practical operation of SEM, number of students is quite limited.
Application imformation will be provided in advance of evely quarter, pls find the announce represented at S8-build.