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2016　Advanced Course of Ceramic Thin Film Technology

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Academic unit or major
Graduate major in Materials Science and Engineering
Instructor(s)
Shinozaki Kazuo  Wakiya Naoki  Sakamoto Naonori 
Class Format
Lecture     
Media-enhanced courses
Day/Period(Room No.)
Mon3-4(S7-201)  Thr3-4(S7-201)  
Group
-
Course number
MAT.C403
Credits
2
Academic year
2016
Offered quarter
2Q
Syllabus updated
2016/12/14
Lecture notes updated
2016/8/1
Language used
Japanese
Access Index

Course description and aims

The ceramic thin films are the materials those properties are strongly affected by interface. In this lecture, students study the oxide thin film technologies. In the first half, students will learn the basics of the thin film growth science, thin film growing technologies and their applications. In the latter half, students will learn the characterization technologies of the thin films and the electrical property measurements.

Student learning outcomes

Students will acquire the following skills by taking this course.
1) Learn the basic science of thin film growth.
2) Acquire skills of film formation.
3) Learn analysis techniques for thin films.
4) Be able to design on their own desired film producing processes for oxidized thin films.

Keywords

thin film, thin film growth, epitaxial thin film, oxide thin film, PVD, CVD, residual stress, diffraction method, spectroscopy method, probe microscope, electrical properties

Competencies that will be developed

✔ Specialist skills Intercultural skills Communication skills ✔ Critical thinking skills ✔ Practical and/or problem-solving skills

Class flow

Exercise problems will be given. Attendance is taken in every class.

Course schedule/Required learning

  Course schedule Required learning
Class 1 Course outline. Introduction of thin film technologies (I) : definition of thin film, history of thin film science, various application of thin films. Students understand the course contents. Students have to explain about the thin films.
Class 2 Introduction of thin film technologies (II) : thin film growth technologies, PVD, CVD, CSD, thin film growth through solid state crystallization. Students have to explain the overview of thin film production technologies.
Class 3 Basics of thin film growth (I) : mass transport in vapor phase, decomposition of raw material Students have to explain the mass transport in vapor phase and decomposition process of raw material near the substrate.
Class 4 Basics of thin film growth (II) : reaction of raw material, adsorption of molecule on surface, behavior of molecular and atom on surface Students have to explain the gas phase reaction, adsorption of molecule and the behavior of molecular and atom on surface.
Class 5 Basics of thin film growth (III) : surface reconstruction of substrate, physical and chemical adsorption, reaction at surface Students have to explain the physical and chemical adsorption of the atoms, and the chemical reaction on the substrate.
Class 6 Basics of thin film growth (IV) : structure of thin film, crystal structure of thin film, growth conditions and their crystalline state, epitaxial film growth Students have to explain the growth process, crystallization and epitaxial growth of thin film.
Class 7 Oxide thin film growth by PVD method and their application Students have to explain the PVD process and its application.
Class 8 Oxide thin film growth by CVD method and their application Students have to explain the CVD process and its application.
Class 9 Application of thin film : thin film coating for engineering field application Students have to explain the application of thin film in the engineering field.
Class 10 Characterization technology (I) : Fundamentals of X-ray diffraction method and its application for characterization of thin film structure Students have to explain the characterization of thin film by X-ray diffraction method.
Class 11 Characterization technology (I) : Fundamentals of transmission electron microscopy and its application for characterization of thin film structure Students have to explain the characterization of thin film by transmission electron method.
Class 12 Characterization technology (III) : molecular vibration and calculation of lattice vibration Students have to explain the molecular vibration and calculation of lattice vibration.
Class 13 Characterization technology (IV) : measurement of lattice vibration in thin film Students have to explain the measurement of lattice vibration in thin film.
Class 14 Characterization technology (V) : basics of scanning probe microscope and its application to thin film Students have to explain the scanning probe microscope.
Class 15 Characterization technology (VI) : electrical properties of thin film and measurement methods Students have to explain the electrical properties of thin film and measurement methods.

Textbook(s)

None required.

Reference books, course materials, etc.

All materials used in class can be found on OCW-i in advance.
reference books:
Mashito et. al., ed.　Handbook of Thin Film Technology Kodansha Scientific (1998) ISBN4-06-153953-1
Asamaki Tatsuo Basic Thin Film Technology, 3rd ed. Nikkan-Kogyo-Shimbun (1996) ISBN4-526-03831-8

Assessment criteria and methods

Student's course scores are based on final exams (90%) and attendance or home work (10%).

Related courses

  • None

Prerequisites (i.e., required knowledge, skills, courses, etc.)

No prerequisites.

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