Organic polymeric materials are an important soft material which supports the next generation industry. This course gives an overview of polymerization mechanism of radical and ion polymerization, and the synthesis of block copolymers which can be useful for creation of nanostructures. A variety of applications based on the precise controlled block copolymer nanostructures such as semicondutor lithography resists are also shown.
By the end of this course, students will:
1) Grasp the basic concept of organic semiconducting polymers and soft materials.
2) Understand the factors in determining molecular weights and polydispersity in chain polymerization.
3) Know the demands and latest information of organic devices and its performances.
Polymers, radical polymerization, ion polymerization, polymer reactions, molecular weight distribution, block copolymer, semiconductor lithography, organic electronic devices
|✔ Specialist skills||Intercultural skills||Communication skills||Critical thinking skills||Practical and/or problem-solving skills|
Two‒thirds of each class is devoted to fundamentals and the rest to advanced content or application. To allow students to get a good understanding of the course contents and practical applications, recent literature related to the contents of this course is searched.
|Course schedule||Required learning|
|Class 1||Properties of Organic Polymeric Materials||Understand the properties of general polymers based on the definition of polymers.|
|Class 2||Radical Polymerization||Explain the reaction mechanism of radical polymerizations.|
|Class 3||Ion Polymerization (I)||Explain the characteristic and reaction mechanism of ion polymerizations.|
|Class 4||Ion Polymerization (II)||Explain the characteristic and reaction mechanism of ion polymerizations.|
|Class 5||Block Copolymer Synthesis||Explain the synthesis of block copolymers.|
|Class 6||Morphology and Structure Control of Microphase-separated Nanostructures||Explain the morphology and structure control of microphase-separated nanostructures.|
|Class 7||Semiconductor Lithography I||Explain the basic concept of next generation semiconductor lithography based on block copolymer microphase-separated nanostructures.|
|Class 8||Semiconductor Lithography II||Explain the demands and structure control of next generation semiconductor lithography based on block copolymer microphase-separated nanostructures.|
Nothing in particular.
All materials used in classes are supplied.
Evaluate the degree of comprehension of the synthesis and functions of organic polymeric materials.