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School of Engineering
- Undergraduate major in Mechanical Engineering
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- Common courses
- School of Materials and Chemical Technology
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- 工学院，物質理工学院，環境・社会理工学院共通科目
- Liberal arts and basic science courses
- First-Year Courses
- School of Science
- School of Engineering
- School of Materials and Chemical Technology
- School of Computing
- School of Life Science and Technology
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School of Environment and Society
- Department of Architecture and Building Engineering
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- Graduate major in Technology and Innovation Management
- Common courses
- Liberal arts and basic science courses
- Academic unit or major
- Undergraduate major in Mechanical Engineering
- Class Format
- Lecture
- Media-enhanced courses
- Day/Period(Room No.)
- Mon1-2(I321)
- Group
- -
- Course number
- MEC.J331
- Credits
- 1
- Academic year
- 2018
- Offered quarter
- 1Q
- Syllabus updated
- 2018/3/20
- Lecture notes updated
- -
- Language used
- Japanese
- Access Index
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Course description and aims
This course covers applications and various microfabrication methods to design and fabricate MEMS/NEMS devices. Methods include, patterning based on photolithography, deposition, etching (wet & dry), nanofabrication technologies, next-generation fabrication technologies, and the physics behind them. Enrollment preference is given to any students.
Student learning outcomes
By the end of this course, students will be able to:
1) Acquire the baseline knowledge about the theory and methods of various microfabrication techniques based on photolithography, and the ability to apply for developing the MEMS/NEMS devices.
2) Design the basic level of MEMS/NEMS devices.
Keywords
MEMS, NEMS, Micromachine, Nanomachine, Photolithography, Deposition, Wet&Dry etching, Nanofabrication, Next-generation fabrication technology
Competencies that will be developed
| ✔ Specialist skills | Intercultural skills | Communication skills | Critical thinking skills | Practical and/or problem-solving skills |
Class flow
Each theme every week.
Course schedule/Required learning
| Course schedule | Required learning | |
|---|---|---|
| Class 1 | Overview of MEMS/NEMS | Study what are MEMS?, and the applications. |
| Class 2 | Patterning | Understand the patterning method base on photolithography. |
| Class 3 | DepositionStudy various deposition methods. | Understand the various deposition methods. |
| Class 4 | Wet etching | Understand what the wet etching is. |
| Class 5 | Dry etching | Understand what the dry etching is. |
| Class 6 | Nano-fabrication | Study nanofabrication methods. |
| Class 7 | Next-generation fabrication technology | Study Next-generation micro/nano fabrication methods. |
| Class 8 | Summary | Get a better understanding the overview of microfabrication technologies to fabricate MEMS/NEMS devices, by turning around the previous lectures. |
Textbook(s)
None
Reference books, course materials, etc.
Japanese book only.
Assessment criteria and methods
By final test(about 70%) and assignments (about 30%)
Related courses
- MEC.G311 ： Introduction to Manufacturing Engineering
- MEC.G331 ： Production System Engineering
Prerequisites (i.e., required knowledge, skills, courses, etc.)
None
