This course covers applications and various microfabrication methods to design and fabricate MEMS/NEMS devices. Methods include, patterning based on photolithography, deposition, etching (wet & dry), nanofabrication technologies, next-generation fabrication technologies, and the physics behind them. Enrollment preference is given to any students.
By the end of this course, students will be able to:
1) Acquire the baseline knowledge about the theory and methods of various microfabrication techniques based on photolithography, and the ability to apply for developing the MEMS/NEMS devices.
2) Design the basic level of MEMS/NEMS devices.
MEMS, NEMS, Micromachine, Nanomachine, Photolithography, Deposition, Wet&Dry etching, Nanofabrication, Next-generation fabrication technology
|Intercultural skills||Communication skills||Specialist skills||Critical thinking skills||Practical and/or problem-solving skills|
Each theme every week.
|Course schedule||Required learning|
|Class 1||Overview of MEMS/NEMS||Study what are MEMS?, and the applications.|
|Class 2||Patterning||Understand the patterning method base on photolithography.|
|Class 3||DepositionStudy various deposition methods.||Understand the various deposition methods.|
|Class 4||Wet etching||Understand what the wet etching is.|
|Class 5||Dry etching||Understand what the dry etching is.|
|Class 6||Nano-fabrication||Study nanofabrication methods.|
|Class 7||Next-generation fabrication technology||Study Next-generation micro/nano fabrication methods.|
|Class 8||Summary||Get a better understanding the overview of microfabrication technologies to fabricate MEMS/NEMS devices, by turning around the previous lectures.|
Japanese book only.
By final test(about 70%) and assignments (about 30%)