This course covers applications and various microfabrication methods to design and fabricate MEMS/NEMS devices. Methods include, patterning based on photolithography, deposition, etching (wet & dry), nanofabrication technologies, next-generation fabrication technologies, and the physics behind them. Enrollment preference is given to any students.
By the end of this course, students will be able to:
1) Acquire the baseline knowledge about the theory and methods of various microfabrication techniques based on photolithography, and the ability to apply for developing the MEMS/NEMS devices.
2) Design the basic level of MEMS/NEMS devices.
MEMS, NEMS, Micromachine, Nanomachine, Photolithography, Deposition, Wet&Dry etching, Nanofabrication, Next-generation fabrication technology
✔ Specialist skills | Intercultural skills | Communication skills | Critical thinking skills | Practical and/or problem-solving skills |
Each theme every week.
Course schedule | Required learning | |
---|---|---|
Class 1 | Overview of MEMS/NEMS | Study what are MEMS?, and the applications. |
Class 2 | Patterning | Understand the patterning method base on photolithography. |
Class 3 | DepositionStudy various deposition methods. | Understand the various deposition methods. |
Class 4 | Wet etching | Understand what the wet etching is. |
Class 5 | Dry etching | Understand what the dry etching is. |
Class 6 | Nano-fabrication | Study nanofabrication methods. |
Class 7 | Next-generation fabrication technology | Study Next-generation micro/nano fabrication methods. |
Class 8 | Summary | Get a better understanding the overview of microfabrication technologies to fabricate MEMS/NEMS devices, by turning around the previous lectures. |
None
Japanese book only.
By final test(about 70%) and assignments (about 30%)
None