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2022　Advanced Course of Ceramic Thin Film Technology

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Academic unit or major
Graduate major in Materials Science and Engineering
Instructor(s)
Katase Takayoshi  Funakubo Hiroshi 
Class Format
Lecture    (Livestream)
Media-enhanced courses
Day/Period(Room No.)
Tue1-2()  Fri1-2()  
Group
-
Course number
MAT.C403
Credits
2
Academic year
2022
Offered quarter
1Q
Syllabus updated
2022/3/16
Lecture notes updated
-
Language used
Japanese
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Course description and aims

Thin-film growth process of functional ceramics is an important technology, which has realized high-performance electronic devices, such as smart phone and tablet terminal, and environment devices, such as power generation (storage) devices and LEDs. In this lecture, students study film-growth technologies and characterization methods of ceramic thin films. In the first half, the lecture focuses on basic of thin-film growth techniques, and in the last half, it focuses on thin film characterization methods, in connection with actual devices.

Student learning outcomes

Students will acquire the following skills by taking this course.
1) Learn the basic science of thin-film growth.
2) Acquire skills of film formation.
3) Learn characterization techniques for thin films.
4) Understand application of thin-film technologies in the engineering field.

Keywords

Ceramics thin film, thin-film growth, Physical vapor deposition, Chemical vapor deposition, Structure analysis, Surface analysis, Chemical composition analysis, Electronic state analysis, Electronic property, Optical property, Dielectric property, Thermoelectric property, Magnetic property, Superconducting property

Competencies that will be developed

✔ Specialist skills Intercultural skills Communication skills ✔ Critical thinking skills ✔ Practical and/or problem-solving skills

Class flow

Exercise problems will be given.

Course schedule/Required learning

  Course schedule Required learning
Class 1 Introduction of thin-film technology Students have to understand the importance of thin-film-growth technique and film-property characterization.
Class 2 Basic of thin-film growth Students have to explain the thin-film form and crystal growth modes.
Class 3 Epitaxial growth, Hetero-junction, Superlattice Students have to explain the epitaxial film growth, and fabrication method of hetero-junction and superlattice, on single crystalline substrate.
Class 4 Physical vapor deposition Students have to explain the vacuum deposition and molecular beam epitaxy method.
Class 5 Physical vapor deposition (II) Students have to explain the Sputtering and Laser ablation method.
Class 6 Chemical vapor deposition Students have to explain the Chemical vapor deposition method.
Class 7 Special thin-film growth techniques Students have to explain the solid-phase epitaxy, liquid-phase epitaxy, and solution process for thin-film growth.
Class 8 Structural analysis Students have to explain the crystal structure analysis of thin film by X-ray diffraction and electron microscope.
Class 9 Surface analysis Students have to explain the surface analysis of thin film by scanning probe microscope.
Class 10 Chemical composition and electronic state analysis Students have to explain the chemical analysis and electronic state characterization of thin film.
Class 11 Optical and Electronic properties of thin film and characterization methods Students have to explain the characterization methods of optical and electronic properties of thin film.
Class 12 Dielectric properties of thin film and characterization methods Students have to explain the characterization methods of dielectric properties of thin film.
Class 13 Piezoelectric properties of thin film and characterization methods Students have to explain the characterization methods of piezoelectric properties of thin film.
Class 14 Superconducting-magnetic-thermoelectric properties of thin film and characterization methods Students have to explain the characterization methods of superconducting-magnetic-thermoelectric properties of thin film.

Out-of-Class Study Time (Preparation and Review)

To enhance effective learning, students are encouraged to spend approximately 100 minutes preparing for class and another 100 minutes reviewing class content afterwards (including assignments) for each class.
They should do so by referring to textbooks and other course material.

Textbook(s)

None required.

Reference books, course materials, etc.

All materials used in class can be found on OCW-i in advance.
Reference books: Donald L. Smith ed. Thin-Film Deposition: Principles and Practice

Assessment criteria and methods

Exercise problems (50%) will be given in the class every time and Reporting assignment (50%) will be give after the final class.

Related courses

  • MAT.C504 ： Functional Devices
  • MAT.C404 ： Physics and Chemistry of Semiconductors

Prerequisites (i.e., required knowledge, skills, courses, etc.)

No prerequisites.

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