Materials and Processes for Microsystems   Materials and Processes for Microsystems

文字サイズ 

担当教員
MILNE WILLIAM IRELAND 
使用教室
集中講義等   
単位数
講義:1  演習:0  実験:0
講義コード
55031
シラバス更新日
2015年10月2日
講義資料更新日
2015年10月2日
アクセス指標
学期
後期

講義概要

Microsystems (otherwise known as MicroElectroMechanical Systems, MEMS) will be discussed in terms of materials and device fabrication processes.

講義の目的

Microsystems (otherwise known as MicroElectroMechanical Systems, MEMS) are mechanical devices that are fabricated on a micrometre scale using techniques more commonly associated with the semiconductor industry for the fabrication of microelectronic devices. They can be classified as either passive devices (e.g. cantilevers, beams) or actuators (e.g. electrostatic drives, thermal expansion actuators) or sensors (e.g. gyroscopes, pressure sensors) and the worldwide market for these devices has expanded greatly in recent years. This course will introduce both the processing methods by which these devices are manufactured and the properties of the materials which are employed, including traditional silicon-based technology and new materials, such as diamond-like carbon, polymers and biological thin films. Case studies will be used with particular reference to one sensing and one actuating application to exemplify how materials and fabrication processes are integrated

講義計画

Introduction (L1)
• Overview of Microsystems technology and introduction of principal case studies
Materials and Growth ( L2 and L3)
• Silicon-based materials including c-Si, Amorphous Si and poly Si and silicon alloys (L2)
• Carbon-based materials including Diamond, Diamond Like Carbon and CNTs, Metals, TCOs and polymers (L3)
Material Selection and Device Fabrication techniques (L4, 5, L6 and 7)
• Material selection L4
• Patterning and wet Etching L5
• Other etching techniques, Bonding, planarisation and biomicrosystems L6
• Process flow and Yield L7

教科書・参考書等

Hand on prints

関連科目・履修の条件等

Semiconductor devices

成績評価

By reports

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